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High K nanophase zinc oxide on biomimetic silicon nanotip array as supercapacitors

Nano Letters, ISSN: 1530-6984, Vol: 13, Issue: 4, Page: 1422-1428
2013
  • 26
    Citations
  • 0
    Usage
  • 41
    Captures
  • 0
    Mentions
  • 2,290
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    26
  • Captures
    41
  • Social Media
    2,290
    • Shares, Likes & Comments
      2,290
      • Facebook
        2,290

Article Description

A 3D trenched-structure metal-insulator-metal (MIM) nanocapacitor array with an ultrahigh equivalent planar capacitance (EPC) of ∼300 μF cm is demonstrated. Zinc oxide (ZnO) and aluminum oxide (Al O) bilayer dielectric is deposited on 1 μm high biomimetic silicon nanotip (SiNT) substrate using the atomic layer deposition method. The large EPC is achieved by utilizing the large surface area of the densely packed SiNT (∼5 × 10 cm) coated conformally with an ultrahigh dielectric constant of ZnO. The EPC value is 30 times higher than those previously reported in metal-insulator-metal or metal-insulator-semiconductor nanocapacitors using similar porosity dimensions of the support materials. © 2013 American Chemical Society.

Bibliographic Details

Han, Hsieh-Cheng; Chong, Cheong-Wei; Wang, Sheng-Bo; Heh, Dawei; Tseng, Chi-Ang; Huang, Yi-Fan; Chattopadhyay, Surojit; Chen, Kuei-Hsien; Lin, Chi-Feng; Lee, Jiun-Haw; Chen, Li-Chyong

American Chemical Society (ACS)

Chemical Engineering; Chemistry; Materials Science; Physics and Astronomy; Engineering

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