Atomic Layer Deposition in a Metal–Organic Framework: Synthesis, Characterization, and Performance of a Solid Acid

Citation data:

Chemistry of Materials, ISSN: 0897-4756, Vol: 29, Issue: 3, Page: 1058-1068

Publication Year:
2017
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DOI:
10.1021/acs.chemmater.6b03880
Author(s):
Martino Rimoldi, Varinia Bernales, Joshua Borycz, Aleksei Vjunov, Leighanne C. Gallington, Ana E. Platero-Prats, I. S. Kim, John L. Fulton, A. B. F. Martinson, Johannes A. Lercher, Karena W. Chapman, Christopher J. Cramer, Laura Gagliardi, Joseph T. Hupp, Omar K. Farha Show More Hide
Publisher(s):
American Chemical Society (ACS)
Tags:
Chemistry, Chemical Engineering, Materials Science
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article description
NU-1000, a zirconium-based metal-organic framework (MOF) featuring mesoporous channels, has been postsynthetically metalated via atomic layer deposition in a MOF (AIM) employing dimethylaluminum iso-propoxide ([AlMeOPr], DMAI), a milder precursor than widely used trimethylaluminum (AlMe, TMA). The aluminum-modified NU-1000 (Al-NU-1000) has been characterized with a comprehensive suite of techniques that points to the formation of aluminum oxide clusters well dispersed through the framework and stabilized by confinement within small pores intrinsic to the NU-1000 structure. Experimental evidence allows for identification of spectroscopic similarities between Al-NU-1000 and γ-AlO. Density functional theory modeling provides structures and simulated spectra, the relevance of which can be assessed via comparison to experimental IR and EXAFS data. The catalytic performance of Al-NU-1000 has been benchmarked against γ-AlO, with promising results in terms of selectivity.

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