Synchrotron radiation photoemission study of in situ manganese silicate formation on SiO for barrier layer applications
Applied Physics Letters, ISSN: 0003-6951, Vol: 98, Issue: 11
2011
- 33Citations
- 16Captures
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Article Description
Synchrotron radiation photoelectron spectroscopy (SRPES) is used to investigate the in situ formation of ultra thin Mn silicate layers on SiO , which has relevance for copper diffusion barrier layers in microelectronic devices. High temperature vacuum annealing of metallic Mn (∼1.5 nm) deposited on a 4 nm thermally grown SiO film results in the self limiting formation of a magnesium silicate layer, the stoichiometry of which is consistent with the formation of MnSiO. Curve fitted Mn 3p SRPES spectra show no evidence for the presence of a manganese oxide phase at the Mn/ SiO interface, in contrast to previous reports. © 2011 American Institute of Physics.
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