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Tetrahedral amorphous carbon films prepared by magnetron sputtering and dc ion plating

Journal of Applied Physics, ISSN: 0021-8979, Vol: 79, Issue: 3, Page: 1416-1422
1996
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Metrics Details

  • Citations
    198
    • Citation Indexes
      198
  • Captures
    108

Article Description

Highly tetrahedral, dense amorphous carbon (ta-C) films have been deposited using rf sputtering of graphite by an unbalanced magnetron with intense dc Ar-ion plating at low temperatures (<70 °C). The ratio of the argon ion flux to neutral carbon flux Φ,/Φ is about 5. The film density and compressive stress are found to pass through a maximum of 2.7 g/cm and 16 GPa, respectively, at an ion plating energy of about 100 eV. Experiments with higher ion flux ratios of Φ/Φ = 10 show that it is possible to deposit carbon films with densities up to 3.1 g/cm and sp contents up to 87%. Deposition of ta-C in this experiment when the energetic species is Ar appears to require a minimum stress of 14 GPa to create significant sp bonding, which contrasts with the continuous increase in sp content with stress when the energetic species is C ions themselves. These results are used to discuss possible deposition mechanisms. © 1996 American Institute of Physics.

Bibliographic Details

J. Schwan; S. Ulrich; H. Roth; H. Ehrhardt; S. R. P. Silva; J. Robertson; R. Samlenski; R. Brenn

AIP Publishing

Physics and Astronomy

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