One-step in-diffusion as a result of multipulse laser irradiation of linbo single crystalline substrates covered with thin Ti deposits: On the effect of the radiation wavelength
Journal of Modern Optics, ISSN: 1362-3044, Vol: 40, Issue: 6, Page: 1043-1052
1993
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Article Description
We studied Ti in-diffusion as an effect of multipulse laser irradiation, in either visible of ultraviolet (u.v.) spectral ranges, of LiNbO singlecrystalline structures with Ti coatings of two different thicknesses. It is shown that while u.v. (excimer, λ ≈ 308 nm) laser irradiation causes a complete expulsion of the Ti deposit, the visible (ruby, λ ≈ 694. 3 nm) laser irradiation at intermediate incident laser fluence (up to ≈ 0. 7 J cm) promotes efficient Ti in-diffusion from the thin (400 Å. width) Ti deposit down to a micrometre range implantation depth. © 1993 Taylor and Francis Ltd.
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