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Investigation on the post-treatment after pulsed Nd:YAG laser texturing on silicon solar cells surfaces

Proceedings of SPIE - The International Society for Optical Engineering, ISSN: 1996-756X, Vol: 11387
2020
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Conference Paper Description

Surface texturing is very important in silicon solar cells fabrication. Generally, wet chemical etched is used to texture silicon wafer surfaces. However, wet chemical technique is not suitable for all types of silicon wafers due to different crystallographic orientation of grains. Therefore, in this paper, pulsed Nd:YAG laser is used to texturing silicon wafer surfaces. Laser texturing is chosen because it can be applied on any types of silicon wafers and it can work independently without relying on silicon wafer properties after all. Although laser can make a texture on silicon wafer surfaces, but there is some drawbacks of using laser texturing. Laser texturing produced unwanted particles and created surface damage layer with a lot of laser ablation residues. This unwanted particles and residues must be remove in order to avoid surface recombination on solar cells. A simple method was applied as a post treatment after laser texturing. To see the effects of silicon solar cells with and without laser texturing, before and after post-texturing cleaning steps, a reflectance measurement is conducted. The reflectance data from UV-Vis Spectrophotometer shown a huge reduction with lowest reflectance is achieved after laser texturing and post treatment which are from 40% to below 10% and 20% of reflectance, respectively. The lowest reflectance is achieved because the flat surfaces has been textured and it has a high roughness. Although the reflectance increase a little bit after post treatment, pulsed Nd:YAG laser texturing still a good technique to be used for texture silicon wafer because it can work independently on any types of silicon wafers.

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