Silicide formation during heat treatment of thin Ni-Pt and Ni-Pd solid-solution films and Pt/Ni bilayers on (111)Si
Inorganic Materials, ISSN: 0020-1685, Vol: 42, Issue: 2, Page: 151-159
2006
- 11Citations
- 5Captures
Metric Options: CountsSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
It is shown that isothermal heat treatment of (Ni-Pt)/Si and Pt/Ni/Si heterostructures leads to the formation of oriented Ni- and Pt-based silicide solid solutions. Owing to the three equivalent azimuth orientations in the basic lattice orientation relationship for the Si-Ni Pt Si system, the resulting silicides have a nanocrystalline substructure. The stability of the substructure is due to the optimal interfacial lattice match and near-special grain-boundary misorientations. The silicide phases Ni Pt Si and Pt Ni Si (or Ni Pd Si and Pd Ni Si) may undergo segregation, having the same lattice orientation. In both systems, the segregation is associated with the predominant Ni diffusion. The second component (Pt) is shown to stabilize the orthorhombic Ni-based silicide and to prevent NiSi formation. Photon processing accelerates diffusion and leads to the formation of phase-pure Ni Pt Si solid solutions. © Pleiades Publishing, Inc., 2006.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=33644822721&origin=inward; http://dx.doi.org/10.1134/s0020168506020087; http://link.springer.com/10.1134/S0020168506020087; http://link.springer.com/content/pdf/10.1134/S0020168506020087; http://link.springer.com/content/pdf/10.1134/S0020168506020087.pdf; http://link.springer.com/article/10.1134/S0020168506020087/fulltext.html; https://dx.doi.org/10.1134/s0020168506020087; https://link.springer.com/article/10.1134/S0020168506020087
Pleiades Publishing Ltd
Provide Feedback
Have ideas for a new metric? Would you like to see something else here?Let us know