Transparent interconnections formed by rapid single-step fabrication of graphene patterns

Citation data:

Applied Physics Letters, ISSN: 0003-6951, Vol: 99, Issue: 5

Publication Year:
2011
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Repository URL:
http://scholarsmine.mst.edu/mec_aereng_facwork/608
DOI:
10.1063/1.3622660
Author(s):
Park, Jongbok; Xiong, Wei; Xie, Zhi Qiang; Gao, Yang; Qian, Min; Mitchell, M.; Mahjouri-Samani, Masoud; Zhou, Yunshen; Jiang, Lan; Lu, Yongfeng
Publisher(s):
AIP Publishing; Applied Physics Letters
Tags:
Physics and Astronomy; Graphene; Nickel; Electrodes; Interconnects; Chemical Vapor Deposition; Surface Patterning; Gold; Laser Beams; Multilayers; Vacuum Chambers; Graphene; Nickel; Electrodes; Interconnects; Chemical Vapor Deposition; Surface Patterning; Gold; Laser Beams; Multilayers; Vacuum Chambers; Aerospace Engineering; Mechanical Engineering
article description
We developed a process to form transparent interconnections using graphene patterns that were synthesized by laser chemical vapor deposition. The number of graphene layers was tightly controlled by laser scan speed. Graphene patterns were fabricated at a high scan speed of up to 200 m/s with a single-step process. The process time is about a million times faster than the conventional chemical vapor deposition method. The fabricated graphene patterns on nickel foils were directly transferred to desired positions on patterned electrodes. The position-controlled transfer with rapid single-step fabrication of graphene patterns provides an innovative pathway for graphene-based interconnections. © 2011 American Institute of Physics.