Deep centers in n-GaN grown by reactive molecular beam epitaxy
- Citation data:
Applied Physics Letters, ISSN: 0003-6951, Vol: 72, Issue: 18, Page: 2277-2279
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- Repository URL:
- https://works.bepress.com/david_look/22; https://scholarscompass.vcu.edu/egre_pubs/28; https://corescholar.libraries.wright.edu/physics/59; https://scholarscompass.vcu.edu/cgi/viewcontent.cgi?article=1123&context=egre_pubs
- Physics and Astronomy; Electrical and Computer Engineering; Physical Sciences and Mathematics; Physics
Deep centers in Si-doped n-GaN layers grown by reactive molecular beam epitaxy have been studied by deep-level transient spectroscopy as a function of growth conditions. Si-doped GaN samples grown on a Si-doped n-GaN contact layer at 800°C show a dominant trap Cwith activation energy E=0.44eV and capture cross-section σ=1.3×10cm, while samples grown at 750°C on an undoped semi-insulating GaN buffer show prominent traps Dand E, with E=0.20eV and σ=8.4×10cm, and E=0.21eV and σ=1.6×10cm, respectively. Trap Eis believed to be related to a N-vacancy defect, since the Arrhenius signature for Eis very similar to the previously reported trap E, which is produced by 1-MeV electron irradiation in GaN materials grown by both metalorganic chemical-vapor deposition and hydride vapor-phase epitaxy. © 1998 American Institute of Physics.