In Situ Electrochemical Activation of Atomic Layer Deposition Coated MoSBasal Planes for Efficient Hydrogen Evolution Reaction

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Advanced Functional Materials, ISSN: 1616-3028, Vol: 27, Issue: 34

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Youngmin Kim; David H. K. Jackson; Daewon Lee; Min Choi; Tae-Wan Kim; Soon-Yong Jeong; Ho-Jeong Chae; Hyun Woo Kim; Noejung Park; Hyunju Chang; Thomas F. Kuech; Hyung Ju Kim Show More Hide
Materials Science; Physics and Astronomy; Chemistry; atomic layer deposition; basal plane; electrochemical activation; hydrogen evolution reaction; MoS2 electrocatalysts
article description
Molybdenum disulfide (MoS), which is composed of active edge sites and a catalytically inert basal plane, is a promising catalyst to replace the state-of-the-art Pt for electrochemically catalyzing hydrogen evolution reaction (HER). Because the basal plane consists of the majority of the MoSbulk materials, activation of basal plane sites is an important challenge to further enhance HER performance. Here, an in situ electrochemical activation process of the MoSbasal planes by using the atomic layer deposition (ALD) technique to improve the HER performance of commercial bulk MoSis first demonstrated. The ALD technique is used to form islands of titanium dioxide (TiO) on the surface of the MoSbasal plane. The coated TiOon the MoSsurface (ALD(TiO)-MoS) is then leached out using an in situ electrochemical activation method, producing highly localized surface distortions on the MoSbasal plane. The MoScatalysts with activated basal plane surfaces (ALD(Act.)-MoS) have dramatically enhanced HER kinetics, resulting from more favorable hydrogen-binding.