Effects of Thin Film Deposition on Fabrication of Switchable Mirror

Citation data:

Molecular Crystals and Liquid Crystals, ISSN: 1542-1406, Vol: 550, Issue: 1, Page: 219-224

Publication Year:
2011
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Repository URL:
http://scholarworks.unist.ac.kr/handle/201301/16947
DOI:
10.1080/15421406.2011.599751
Author(s):
Kim, Jun-Woo, Kim, Kun-Ho, Lee, Sang-Mun, Kim, Bo-Sung, Park, Joo-Hee, Lee, Yun-Su, Park, Lee Soon
Publisher(s):
Informa UK Limited, TAYLOR & FRANCIS LTD
Tags:
Chemistry, Materials Science, Physics and Astronomy, Electrochromic film, TiO2, Nb2O5, Switchable mirror, Photocatalyst layer
article description
In this paper we studied switchable mirrors for application to transparent flat panel displays. The typical structure of switchable mirror has configuration of MgNi/Pd/TaO/HxWO/ITO. In this study photocatalyst layer (TiO or NbO) was used between Pd and TaO layers. These layers were prepared by RF magnetron sputtering method utilizing TiO and Nb O targets under various conditions and their electrochromic properties were investigated by using FE-SEM, EDAX and Nano View system. The transmittances of the NbO and the TiO thin films, could be optimized in the switchable mirror as photocatalyst layer, where they were deposited under the power of 80 W and 70 W, respectively, by the RF magnetron sputter. The characteristics of Nb O and TiO transmittance are the outstanding at 80 W, 70 W respectively. Copyright © Taylor & Francis Group, LLC.

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