Lithographic deposition of patterned metal-organic framework coatings using a photobase generator

A photobase generator was used to induce metal-organic framework (MOF) nucleation upon UV irradiation. This method was further developed into a simple, one-step method for depositing patterned MOF films. Furthermore, the ability of our method to coat a single substrate with MOF films having different chemical compositions is illustrated. The method is an important step towards integrating MOF deposition with existing lithographic techniques and the incorporation of these materials into sensors and other electronic devices. A photobase generator and UV irradiation were used to generate the metal-organic frameworks HKUST-1 and {Cu(trans-1,4-cyclohexanedicarboxylate)} at room temperature. This method was subsequently applied to the preparation of patterned metal-organic framework coatings. © 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.