Closing the gap between n- and p-type silicon heterojunction solar cells: 24.47% efficiency on lightly doped Ga wafers
Progress in Photovoltaics: Research and Applications, ISSN: 1099-159X, Vol: 31, Issue: 12, Page: 1235-1244
2023
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
Silicon heterojunction (SHJ) solar cells can be formed using n-type or p-type silicon wafers. To foster the increasing industrial interest of SHJ, cheaper p-type wafers with a good availability might be preferred, but until today, they yield lower cell efficiency compared with n-type and show instabilities in the particular case of boron doping. This work shows that the production flow of high performance rear-junction bifacial n-type cells can be applied to front-junction p-type cells without process alterations and with a loss of efficiency as low as −0.3% provided that the wafer bulk lifetime is high enough. For this, we propose the use of wafers with gallium doping on which we obtained on a semi-industrial pilot line SHJ p-type cells mostly stable under moderated heat and light and with an efficiency closed to n-type references. The best p-type cell was externally certified at 24.47% total area.
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