Preparation of nanoporous poly(methyl silsesquioxane) thin films derived from chemically linked carbon cages
Macromolecular Research, ISSN: 1598-5032, Vol: 13, Issue: 3, Page: 176-179
2005
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Article Description
Using chemically linked adamantylphenols as pore generators, we successfully realized a nanoporous poly(methyl silsesquioxane) thin film with a dielectric constant of 2.1 and an elastic modulus of 3.8 GPa, which constitutes a potential candidate material for low-k dielectrics and anti-reflective coatings. ©2005 Polymer Society of Korea.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=21644445600&origin=inward; http://dx.doi.org/10.1007/bf03219049; http://link.springer.com/10.1007/BF03219049; http://link.springer.com/content/pdf/10.1007/BF03219049; http://link.springer.com/content/pdf/10.1007/BF03219049.pdf; http://link.springer.com/article/10.1007/BF03219049/fulltext.html; http://www.springerlink.com/index/pdf/10.1007/BF03219049; http://www.springerlink.com/index/10.1007/BF03219049; https://dx.doi.org/10.1007/bf03219049; https://link.springer.com/article/10.1007/BF03219049
Springer Science and Business Media LLC
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