Thickness-dependence of optical constants for Ta O ultrathin films
Applied Physics A: Materials Science and Processing, ISSN: 0947-8396, Vol: 108, Issue: 4, Page: 975-979
2012
- 28Citations
- 15Captures
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Article Description
An effective method for determining the optical constants of Ta O thin films deposited on crystal silicon (c-Si) using spectroscopic ellipsometry (SE) measurement with a two-film model (ambient-oxide-interlayer-substrate) was presented. Ta O thin films with thickness range of 1-400 nm have been prepared by the electron beam evaporation (EBE) method. We find that the refractive indices of Ta O ultrathin films less than 40 nm drop with the decreasing thickness, while the other ones are close to those of bulk Ta O . This phenomenon was due to the existence of an interfacial oxide region and the surface roughness of the film, which was confirmed by the measurement of atomic force microscopy (AFM). Optical properties of ultrathin film varying with the thickness are useful for the design and manufacture of nano-scaled thin-film devices. © 2012 Springer-Verlag.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84865229000&origin=inward; http://dx.doi.org/10.1007/s00339-012-7007-2; http://link.springer.com/10.1007/s00339-012-7007-2; http://link.springer.com/content/pdf/10.1007/s00339-012-7007-2; http://link.springer.com/content/pdf/10.1007/s00339-012-7007-2.pdf; http://link.springer.com/article/10.1007/s00339-012-7007-2/fulltext.html; http://www.springerlink.com/index/10.1007/s00339-012-7007-2; http://www.springerlink.com/index/pdf/10.1007/s00339-012-7007-2; https://dx.doi.org/10.1007/s00339-012-7007-2; https://link.springer.com/article/10.1007/s00339-012-7007-2
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