Atomic nanofabrication with complex light fields
Applied Physics B: Lasers and Optics, ISSN: 0946-2171, Vol: 77, Issue: 1, Page: 1-9
2003
- 22Citations
- 31Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
The method of neutral atom lithography allows one to transfer to a substrate a 2D intensity modulation of an atomic beam imposed by an inhomogeneous light field. The complexity of the pattern depends on the properties of the light field constructed from the superposition of multiple laser beams. For the design of suitable light fields we present a mathematical model with a corresponding numerical simulation of the so-called inverse problem. Furthermore, details of an experiment carried out with a holographically reconstructed light field are discussed.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0141792663&origin=inward; http://dx.doi.org/10.1007/s00340-003-1234-3; http://link.springer.com/10.1007/s00340-003-1234-3; http://link.springer.com/content/pdf/10.1007/s00340-003-1234-3; http://link.springer.com/content/pdf/10.1007/s00340-003-1234-3.pdf; http://link.springer.com/article/10.1007/s00340-003-1234-3/fulltext.html; https://dx.doi.org/10.1007/s00340-003-1234-3; https://link.springer.com/article/10.1007/s00340-003-1234-3
Springer Science and Business Media LLC
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