Crystallization and electrical properties of (BaPb )SrTiO thin film by pulsed laser deposition
Journal Wuhan University of Technology, Materials Science Edition, ISSN: 1000-2413, Vol: 22, Issue: 4, Page: 634-637
2007
- 3Citations
- 2Captures
Metric Options: CountsSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
(BaPb)SrTiO thin films were fabricated via pulsed laser deposition (PLD) technique on Pt/TiO /SiO/Si substrate. The crystallization of the films was characterized by XRD and FSEM, and the experimental results suggested deposition parameters, especially the deposition temperature was the key factor in forming the perovskite structure. The dielectric properties of the film deposited with optimized parameters were studied by an Agilent 4294A impedance analyzer at 1 MHz. The dielectric constant was 772, and the loss tangent was 0.006. In addition, the well-shaped hysteresis loop also showed that the film had a well performance in ferroelectric. The saturated polarization P , remnant polarization P and coercive field E were about 4.6 μC/cm, 2.5 μC/cm and 23 kV/cm (the coercive voltage is 0.7 V), respectively. It is suggested the film should be a promising candidate for microwave applications and nonvolatile ferroelectric random access memories (NvFeRAMs). © 2007 Wuhan University of Technology and Springer-Verlag Berlin Heidelberg.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=38049129374&origin=inward; http://dx.doi.org/10.1007/s11595-006-4634-5; http://link.springer.com/10.1007/s11595-006-4634-5; http://link.springer.com/content/pdf/10.1007/s11595-006-4634-5; http://link.springer.com/content/pdf/10.1007/s11595-006-4634-5.pdf; http://link.springer.com/article/10.1007/s11595-006-4634-5/fulltext.html; https://dx.doi.org/10.1007/s11595-006-4634-5; https://link.springer.com/article/10.1007/s11595-006-4634-5; http://www.springerlink.com/index/10.1007/s11595-006-4634-5; http://www.springerlink.com/index/pdf/10.1007/s11595-006-4634-5
Springer Science and Business Media LLC
Provide Feedback
Have ideas for a new metric? Would you like to see something else here?Let us know