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Evaluating Variability and Improving Tolerance in a Novel and Compact Silicon Photonic Michelson Interferometer

Silicon, ISSN: 1876-9918, Vol: 14, Issue: 15, Page: 9945-9958
2022
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Article Description

We present a novel, tolerant and compact common mirror silicon photonic Michelson Interferometer (T-CMMI). Firstly, we demonstrate a simple theoretical method to calibrate the design variability by evaluating the thickness and width of the waveguide from the transmission response of a general Michelson interferometer (MI). The calibration error for evaluated width (Δ Error ) and thickness (Δ Error ) using this method is within ± 0.47 nm. Secondly, the virtual wafer-based Monte Carlo (VW-MC) approach is used to model the coordinate aware manufacturing variations of the MI layout at the design stage itself. With fixed input parameters of VM-MC at ΔL = 50 μm, the proposed T-CMMI shows the best tolerance with a peak wavelength standard deviation (σ) value of only 0.32 nm, while the σ values for tapered and nominal MI are 0.83 nm and 1.91 nm respectively. For a maximum tolerance for peak wavelength shift set to ± 0.62 nm, only 23 percent of nominal MI structure, 54 percent of tapered MI, and 91 percent of T-CMMI structure is quantitatively evaluated to be fit for design. (3-sigma method). For the same ΔL of 50 μm, footprint of T-CMMI layout design reduces to 35 μm×135μm compared to tapered MI structure of 125 μm×135μmsaving12.150×103μm2 of wafer area.

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