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Effects of pressure and deposition time on the characteristics of InSe films grown by magnetron sputtering

Electronic Materials Letters, ISSN: 2093-6788, Vol: 10, Issue: 6, Page: 1093-1101
2014
  • 15
    Citations
  • 0
    Usage
  • 16
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    15
    • Citation Indexes
      15
  • Captures
    16

Article Description

Crystalline InSe films were fabricated by magnetron sputtering from a sintered InSe-compound target and the effects of the deposition parameters, including the working pressure and deposition time, on the phase composition, structure, morphology, and optical properties were clarified. Single-phase κ-InSe was prepared at 4.0 Pa, but γ-InSe was recognized when the working pressure was lower than 4.0 Pa. The optical transmittance of the films decreased to 45% and the optical band gap varied from 2.9 to 2.0 eV with increasing film thickness from 80 to 967 nm. Metal-semiconductor-metal (MSM) photodetectors based on γ-InSe thin films with various thicknesses were also fabricated. The result of photosensitivity research on such MSM photodetectors suggests that it may be impossible to fabricate wide-absorption-range MSM devices by just using a single material (γ-InSe) because of spatial potential fluctuations in the layers.[Figure not available: see fulltext.].

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