Controllable Vapor Growth of Large-Area Aligned CdSSe Nanowires for Visible Range Integratable Photodetectors
Nano-Micro Letters, ISSN: 2150-5551, Vol: 10, Issue: 4, Page: 58
2018
- 26Citations
- 18Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
Abstract: The controllable growth of large area band gap engineered-semiconductor nanowires (NWs) with precise orientation and position is of immense significance in the development of integrated optoelectronic devices. In this study, we have achieved large area in-plane-aligned CdSSe nanowires via chemical vapor deposition method. The orientation and position of the alloyed CdSSe NWs could be controlled well by the graphoepitaxial effect and the patterns of Au catalyst. Microstructure characterizations of these as-grown samples reveal that the aligned CdSSe NWs possess smooth surface and uniform diameter. The aligned CdSSe NWs have strong photoluminescence and high-quality optical waveguide emission covering almost the entire visible wavelength range. Furthermore, photodetectors were constructed based on individual alloyed CdSSe NWs. These devices exhibit high performance and fast response speed with photoresponsivity ~ 670 A W and photoresponse time ~ 76 ms. Present work provides a straightforward way to realize in-plane aligned bandgap engineering in semiconductor NWs for the development of large area NW arrays, which exhibit promising applications in future optoelectronic integrated circuits.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=85049247531&origin=inward; http://dx.doi.org/10.1007/s40820-018-0211-7; http://www.ncbi.nlm.nih.gov/pubmed/30393706; http://link.springer.com/10.1007/s40820-018-0211-7; https://dx.doi.org/10.1007/s40820-018-0211-7; https://link.springer.com/article/10.1007/s40820-018-0211-7
Springer Science and Business Media LLC
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