Bias voltage effect on the structure and property of chromium copper–diamond-like carbon multilayer films fabricated by cathodic arc plasma
Applied Surface Science, ISSN: 0169-4332, Vol: 256, Issue: 24, Page: 7490-7495
2010
- 25Citations
- 22Captures
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Article Description
Chromium copper–diamond-like carbon (Cr:Cu)-DLC films were deposited onto silicon and by cathodic arc evaporation process using chromium (Cr) and copper (Cu) target arc sources to provide Cr and Cu in the Me-DLC. Acetylene reactive gases were the carbon source and activated at 180 °C at 13 mTorr, and a substrate bias voltage was varied from −50 V to −200 V to provide the (Cr:Cu)-DLC structure. The structure, interface, and chemical bonding state of the produced film were analyzed by transmission electron microscope (TEM), IR Fourier transform (FTIR) spectra, and X-ray photoelectron spectroscopy (XPS). The results showed that the Cr-containing a-C:H/Cu coatings exhibited an amorphous layer of DLC:Cr layer and a crystalline layer of Cu multilayer structure. The profiles of sp 3 /sp 2 (XPS) ratios corresponded to the change of microhardness profile by varying the pressure of the negative DC bias voltage. These (Cr:Cu)-DLC coatings are promising materials for soft substrate protective coatings.
Bibliographic Details
http://www.sciencedirect.com/science/article/pii/S016943321000797X; http://dx.doi.org/10.1016/j.apsusc.2010.05.095; http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=77955428539&origin=inward; https://linkinghub.elsevier.com/retrieve/pii/S016943321000797X; https://dx.doi.org/10.1016/j.apsusc.2010.05.095
Elsevier BV
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