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Effect of angle of deposition on the Fractal properties of ZnO thin film surface

Applied Surface Science, ISSN: 0169-4332, Vol: 416, Page: 51-58
2017
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  • 28
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Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    39
    • Citation Indexes
      39
  • Captures
    28

Article Description

Zinc oxide (ZnO) thin films were prepared by atom beam sputtering at various deposition angles in the range of 20–75°. The deposited thin films were examined by glancing angle X-ray diffraction and atomic force microscopy (AFM). Scaling law analysis was performed on AFM images to show that the thin film surfaces are self-affine. Fractal dimension of each of the 256 vertical sections along the fast scan direction of a discretized surface, obtained from the AFM height data, was estimated using the Higuchi’s algorithm. Hurst exponent was computed from the fractal dimension. The grain sizes, as determined by applying self-correlation function on AFM micrographs, varied with the deposition angle in the same manner as the Hurst exponent.

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