Effect of angle of deposition on the Fractal properties of ZnO thin film surface
Applied Surface Science, ISSN: 0169-4332, Vol: 416, Page: 51-58
2017
- 39Citations
- 28Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
Zinc oxide (ZnO) thin films were prepared by atom beam sputtering at various deposition angles in the range of 20–75°. The deposited thin films were examined by glancing angle X-ray diffraction and atomic force microscopy (AFM). Scaling law analysis was performed on AFM images to show that the thin film surfaces are self-affine. Fractal dimension of each of the 256 vertical sections along the fast scan direction of a discretized surface, obtained from the AFM height data, was estimated using the Higuchi’s algorithm. Hurst exponent was computed from the fractal dimension. The grain sizes, as determined by applying self-correlation function on AFM micrographs, varied with the deposition angle in the same manner as the Hurst exponent.
Bibliographic Details
http://www.sciencedirect.com/science/article/pii/S0169433217311169; http://dx.doi.org/10.1016/j.apsusc.2017.04.098; http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=85018625762&origin=inward; https://linkinghub.elsevier.com/retrieve/pii/S0169433217311169; https://dx.doi.org/10.1016/j.apsusc.2017.04.098
Elsevier BV
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