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RETRACTED: Atomic layer deposition of Rh nanoparticles on WO 3 thin film for CH 4 gas sensing with enhanced detection characteristics

Ceramics International, ISSN: 0272-8842, Vol: 46, Issue: 7, Page: 9936-9942
2020
  • 20
    Citations
  • 0
    Usage
  • 18
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    20
    • Citation Indexes
      20
  • Captures
    18

Article Description

CH gas sensor was fabricated by depositing WO film (200 nm) on a ceramic substrate through E-beam evaporation, followed by depositing Rh nanoparticles on WO through Atomic Layer Deposition (ALD). The amount of Rh nanoparticles was regulated by ALD cycles. The TEM characterization showed that Rh nanoparticles were homogeneously distributed on WO thin film, and the XPS investigation indicated the interactions between Rh nanoparticles and WO thin film. The gas-sensing performance testing showed that, when the Rh ALD deposition cycle is 20, the sample showed the highest selectivity, which is increased by~110% compared with pure WO, which could be attributed to the surface catalytic effect contributed by Rh nanoparticles, while over high concentration of Rh could be harmful to the gas sensing performance, which blocks the active sites on the surface of WO thin film. The sensing stability of WO/Rh composite (with ALD cycle of 20) was further investigated by exposing the sensor in CH gas environment for one week.

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