Inside the different types of carbon black as nanomodifiers for screen-printed electrodes

The need to deliver high performant and miniaturised electrochemical sensors has boosted the use of carbon nanomaterials as smart modifiers of working electrode surface. Among the carbon nanomaterials, the common and cost-effective carbon black has recently attracted the attention from the scientific community for its outstanding features as electrode nanomodifier for analyte detection. Herein, we report the structural and morphological characterisation of several types of carbon blacks, namely HP 160, HS20, MTN 990, N115, N220, N375, N660, PL6, Super P, and XE2B, by means of Raman spectroscopy, transmission electron microscopy (TEM) and scanning electron microscopy (SEM) analyses. Furthermore, the electrochemical characterisation of screen-printed electrodes modified with these carbon blacks was carried out by cyclic voltammetry and electrochemical impedance spectroscopy with ferro/ferricyanide as redox probe, highlighting the advantage to use carbon black as nanomodifier in respect to the bare electrode. Among several tested carbon black types, the lowest peak-to-peak separation and resistance to electron transfer values were achieved using screen-printed electrodes modified with CB N115, N375, HP 160 and PL6. The electrodes modified with these types of CB were successively tested in cyclic voltammetry towards epinephrine, benzoquinone, ascorbic acid, cysteine, catechol, and caffeic acid, observing a remarkable improvement of electrochemical performances in respect to the bare electrode, even when the amperometric mode was used. The results obtained demonstrated that several types of CB can remarkably improve the electrochemical performances of the sensors in terms of the decrease of applied potential or peak-to-peak separation, the improvement of the peak intensity, and the decrease of the resistance of the electron transfer due to several key features, including nanodimensions, the onion-like carbon structure, and the high number of defect sites.