NbRe thin film by magnetron sputtering for selective H 2 , C1 and C3 chemicals synthesis from H 2 O and CO 2
International Journal of Hydrogen Energy, ISSN: 0360-3199, Vol: 69, Page: 1366-1376
2024
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Most Recent News
New Electronics Study Findings Recently Were Reported by Researchers at University of Salerno (Nbre Thin Film By Magnetron Sputtering for Selective H2, C1 and C3 Chemicals Synthesis From H2o and Co2)
2024 JUL 09 (NewsRx) -- By a News Reporter-Staff News Editor at Electronics Daily -- Research findings on Electronics are discussed in a new report.
Article Description
Magnetron sputtering (MS) is a very promising approach for electrode preparation due to its versatility, environmental benignity, and sustainability. In particular, by allowing high control of the deposited nanostructures, MS is characterized by: high deposition rates at low temperatures, deposition of complex species just selecting a specific target, high-density films, and outstanding adhesion of the films on supports. In the following study, the preparation by MS, and thus avoiding toxic chemical reagents, of NbRe thin films, for both hydrogen evolution reaction (HER) and CO 2 reduction reaction (CO 2 RR), was reported. Firstly, the electrocatalytic activity of NbRe thin films was tested towards HER showing promising performance: negligible overpotentials and very small Tafel slopes. Secondly, in the context of carbon recycling, and considering renewable sources intermittence, the electrodes were tested towards CO 2 RR, obtaining selectively C3 compounds. Overall, the proposed study aims to contribute to the development of sustainable catalytic electrochemical processes, supporting the ecological transition.
Bibliographic Details
http://www.sciencedirect.com/science/article/pii/S0360319924018366; http://dx.doi.org/10.1016/j.ijhydene.2024.05.149; http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=85192831332&origin=inward; https://linkinghub.elsevier.com/retrieve/pii/S0360319924018366; https://dx.doi.org/10.1016/j.ijhydene.2024.05.149
Elsevier BV
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