Upgrading the low temperature water gas shift reaction by integrating plasma with a CuO x /CeO 2 catalyst
Journal of Catalysis, ISSN: 0021-9517, Vol: 421, Page: 324-331
2023
- 6Citations
- 12Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
Low temperature WGS reaction is kinetically limited though it is thermodynamically favored. Herein, an outstanding synergistic effect between dielectric barrier discharge (DBD) plasma and non-precious CuO x /CeO 2 catalysts was observed to robustly accelerate the water gas shift (WGS) reaction at 150 °C (increase from 6% to 96% after plasma on). The apparent activation energy of the reaction was remarkablly diminished by plasma (69.6 to 15.0 kJ/mol). In-situ characterization experiments (e. g. OES and DRIFTS) revealed that the OH radicals generated by plasma-induced H 2 O dissociation was found to participate in the WGS reaction. In the furtherly study in DFT calculation and microkinetic modelling investigation, the OH radicals were proved to be one of the reasons for the giant increase in reaction rate. Besides, the vibrational excitation of reactants (e. g. CO) promoted by plasma could also reduce the reaction barriers of some crucial elementary reactions, thus accelerating the reaction rate.
Bibliographic Details
http://www.sciencedirect.com/science/article/pii/S0021951723001203; http://dx.doi.org/10.1016/j.jcat.2023.03.033; http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=85151274863&origin=inward; https://linkinghub.elsevier.com/retrieve/pii/S0021951723001203; https://dx.doi.org/10.1016/j.jcat.2023.03.033
Elsevier BV
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