Formation and evolution of grain structures in thin films
Microelectronic Engineering, ISSN: 0167-9317, Vol: 76, Issue: 1, Page: 195-204
2004
- 22Citations
- 15Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
We describe an approach to studying grain structure formation and evolution in polycrystalline thin films using a “grain continuum” representation of the solid. Formation and evolution of grain structure are tracked using level-set-based geometry software we call PLENTE. We demonstrate the approach using two processes; (1) vapor deposition and (2) grain boundary migration during curvature-driven coarsening. We employ several codes in concert to track the development of grains during deposition while accounting for reaction kinetics, ballistic transport, and re-emission of reactive species.
Bibliographic Details
http://www.sciencedirect.com/science/article/pii/S0167931704004034; http://dx.doi.org/10.1016/j.mee.2004.07.054; http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=4544295210&origin=inward; https://linkinghub.elsevier.com/retrieve/pii/S0167931704004034; https://dx.doi.org/10.1016/j.mee.2004.07.054
Elsevier BV
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