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High-performance photo-self-Fenton control of antibiotic resistance contamination in water mediated by graphene oxide/self-assembled perylene diimide catalyst

Separation and Purification Technology, ISSN: 1383-5866, Vol: 360, Page: 131141
2025
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Herein, a novel photo-self-Fenton (PSF) system based on graphene oxide/self-assembled perylene diimide (GO/SA-PDI) catalyst was constructed to effectively control antibiotic resistance contamination in water. The combination between SA-PDI and GO endowed GO/SA-PDI stronger light absorption ability, more surface reactive sites, and faster charge transfer rate. The H 2 O 2 yield of GO/SA-PDI(80%) (1.50 mM g -1 h −1 ) increased 4.1 times than SA-PDI under visible light. Moreover, the synergistic effect between photocatalysis and Fenton granted GO/SA-PDI-PSF system accelerated Fe 3+ /Fe 2+ transformation efficiency, improved H 2 O 2 utilization rate, and increased oxidizing active species (h +, •OH, etc.), finally remarkably boosting its elimination performance towards sulfonamide antibiotics, resistant bacteria (ARB) and resistance genes (ARGs). The sulfamethoxazole degradation rate (0.18 min −1 ) of GO/SA-PDI(80%)-PSF within 1 h was 120.0 times as that of SA-PDI (0.0015 min −1 ), while the corresponding degradation ratio (93.0%) was 8.6 times as that of Fenton (10.8%). Besides, GO/SA-PDI(80%)-PSF removed 57.2% of TOC after 1 h of sulfadimethoxine degradation, which was 6.9 and 9.7 times as that of SA-PDI (8.3%) and Fenton (5.9%), respectively. Moreover, ARB removal ratio (100.0%) within 15 min of GO/SA-PDI(80%)-PSF was 6.8 times as that of SA-PDI (14.8%), while the corresponding ARGs removal ratio (99.9%) within 2 h was 3.9 times as that of Fenton (25.9%). This study expands the application prospect of PSF technology towards drug-resistant contamination control.

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