Brittle-ductile behavior of single crystals of MoSi 2
Materials Science and Engineering: A, ISSN: 0921-5093, Vol: 261, Issue: 1, Page: 99-105
1999
- 27Citations
- 8Captures
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Article Description
MoSi 2 is a candidate material to be used in oxidizing environments at temperatures higher than the upper limit for Ni-base superalloys (1100–1200°C). Recently, single crystals of MoSi 2 with orientations other than [001] have been found to exhibit plastic flow at temperatures as low as room temperature, while [001]-oriented crystals exhibit appreciable plastic deformation only above 900°C. Five slip systems, {110)〈111], {011)〈100], {010)〈100], {023)〈100] and {013)〈331], have been identified to be operative in MoSi 2 single crystals, depending on crystal orientation. Only {013,〈331] has a non-zero Schmid factor for the exact [001] orientation. However, the critical resolved shear stress for the slip system strongly depends on crystal orientation, in particular near [001]. It drastically increases as the compression axis approaches to [001]. Thus, [001]-oriented crystals can hardly be deformed at low temperatures. First the results of such deformation experiments of single crystals of MoSi 2 are summarized. Finally the results of our recent study of the behavior of Si vacancies and their clusters in MoSi 2 single crystals by positron lifetime spectrometry are summarized. The recovery of electron irradiated specimens begins at 240 K and is completed at 800 K. Thus, Si vacancies in MoSi 2 become mobile at relatively low temperatures. The implications of these results for the deformation of MoSi 2 are briefly discussed.
Bibliographic Details
http://www.sciencedirect.com/science/article/pii/S0921509398010545; http://dx.doi.org/10.1016/s0921-5093(98)01054-5; http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0002906082&origin=inward; https://linkinghub.elsevier.com/retrieve/pii/S0921509398010545; http://linkinghub.elsevier.com/retrieve/pii/S0921509398010545; http://api.elsevier.com/content/article/PII:S0921509398010545?httpAccept=text/xml; http://api.elsevier.com/content/article/PII:S0921509398010545?httpAccept=text/plain; http://dx.doi.org/10.1016/s0921-5093%2898%2901054-5; https://dx.doi.org/10.1016/s0921-5093%2898%2901054-5
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