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Thermally stable polyoxocarbosilane thin films by pulsed IR laser ablation of poly[oxy(tetramethyldisilane-1,2-diyl)]

Chemistry of Materials, ISSN: 0897-4756, Vol: 14, Issue: 3, Page: 1242-1248
2002
  • 26
    Citations
  • 0
    Usage
  • 10
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    26
    • Citation Indexes
      26
  • Captures
    10

Article Description

Pulsed IR laser-induced ablation of bulk poly[oxy(tetramethyldisilane-1,2-diyl)], [(CH)-Si(CH)SiO], yields thin polyoxocarbosilane films whose polymeric structure consists of a backbone composed of -(CH)Si(CH)SiO- and -O(CH)SiO-units, which is cross-linked via SiSiCO, CSiO, CSiHO, CSiHO, and CSiO moieties. These laser-fabricated hybrides of siloxanes and polysilylenes are insoluble in organic solvents and thermally superior to siloxanes and polysilylenes, which makes them intriguing for applications in thermally exposed devices.

Bibliographic Details

Josef Pola; Jaroslav Kupčík; Vratislav Blechta; Anna Galíková; Aftanas Galík; Jan Šubrt; Jan Kurjata; Julian Chojnowski

American Chemical Society (ACS)

Chemistry; Chemical Engineering; Materials Science

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