Thermally stable polyoxocarbosilane thin films by pulsed IR laser ablation of poly[oxy(tetramethyldisilane-1,2-diyl)]
Chemistry of Materials, ISSN: 0897-4756, Vol: 14, Issue: 3, Page: 1242-1248
2002
- 26Citations
- 10Captures
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Article Description
Pulsed IR laser-induced ablation of bulk poly[oxy(tetramethyldisilane-1,2-diyl)], [(CH)-Si(CH)SiO], yields thin polyoxocarbosilane films whose polymeric structure consists of a backbone composed of -(CH)Si(CH)SiO- and -O(CH)SiO-units, which is cross-linked via SiSiCO, CSiO, CSiHO, CSiHO, and CSiO moieties. These laser-fabricated hybrides of siloxanes and polysilylenes are insoluble in organic solvents and thermally superior to siloxanes and polysilylenes, which makes them intriguing for applications in thermally exposed devices.
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