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Controlled dopant distribution and higher doping efficiencies by surface-functionalized atomic layer deposition

Chemistry of Materials, ISSN: 0897-4756, Vol: 23, Issue: 19, Page: 4295-4297
2011
  • 42
    Citations
  • 0
    Usage
  • 76
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    42
    • Citation Indexes
      42
  • Captures
    76

Article Description

Reversible surface functionalization allows control of the precursor saturation coverage and growth per cycle in atomic layer deposition. Functionalizing the ZnO surface with alkyl alcohols, we achieve 2x higher doping efficiencies in Al-doped ZnO compared to conventional atomic layer deposition because of the more efficient dopant distribution in the ZnO host. © 2011 American Chemical Society.

Bibliographic Details

Angel Yanguas-Gil; Kyle E. Peterson; Jeffrey W. Elam

American Chemical Society (ACS)

Chemistry; Chemical Engineering; Materials Science

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