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Novel Laser Ablation Resists for Excimer Laser Ablation Lithography. Influence of Photochemical Properties on Ablation

The Journal of Physical Chemistry B, ISSN: 1520-6106, Vol: 105, Issue: 6, Page: 1267-1275
2001
  • 35
    Citations
  • 0
    Usage
  • 8
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    35
    • Citation Indexes
      35
      • CrossRef
        35
  • Captures
    8

Article Description

The Journal of Physical Chemistry B

Bibliographic Details

J. Wei; N. Hoogen; T. Lippert; O. Nuyken; A. Wokaun

American Chemical Society (ACS)

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