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Preparation of quaternary ammonium organosilane functionalized mesoporous thin films

Langmuir, ISSN: 0743-7463, Vol: 18, Issue: 4, Page: 972-974
2002
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Metrics Details

  • Citations
    21
    • Citation Indexes
      21
  • Captures
    26

Article Description

The preparation of surfactant-templated periodic mesoporous silica thin films functionalized with N-((trimethoxysilyl)propyl)-N,N,N-trimethylammonium chloride (TMAC) is described. The supramolecular self-assembly of the triblock copolymer, Pluronic 123, served as a template for the formation of these functionalized silane films. In the as-prepared and extracted conditions, the films exhibited the p6 mm type hexagonal mesostructure with a large unit cell (a = 8.5-9.6 nm). Contraction of the films during heat treatment (250 °C for 2 h) reduced the pore spacing perpendicular to the substrate yielding Fm3m pore ordering, confirmed by X-ray diffraction and transmission electron microscopy. Ellipsometry measurements revealed the films to have thickness of ∼400 nm in the as-prepared condition and ∼300 nm in the heat-treated condition, a total shrinkage of∼25% perpendicular to the substrate. X-ray photoelectron spectroscopy measurements showed the incorporation of the TMAC to be 76-90% of the amount initially added following surfactant extraction.

Bibliographic Details

Eva M. Wong; Michael A. Markowitz; Bruce P. Gaber; Syed B. Qadri; Stephen L. Golledge; David G. Castner

American Chemical Society (ACS)

Materials Science; Physics and Astronomy; Chemistry

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