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Block cooligomers: A generalized approach to controlling the wetting behavior of block copolymer thin films

Macromolecules, ISSN: 0024-9297, Vol: 43, Issue: 16, Page: 6919-6922
2010
  • 29
    Citations
  • 0
    Usage
  • 27
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    29
    • Citation Indexes
      29
  • Captures
    27

Article Description

A block cooligomer approach to controlling the wetting behaviors of block copolymers in thin films was reported. O(S-b-MrH) was synthesized by two-step sequential nitroxide mediated polymerization using a nitroxide initiator, N-tert-butyl-N-(2-methyl-1-phenylpropyl)-O-(1-phenylethyl)hydroxylamine. Styrene (S), methyl methacrylate (MMA), and hydroxyethyl methacrylate (HEMA) were purified by passing through activated alumina prior to use. Styrene was first polymerized in presence of initiator at δ120°C for 4 h under a nitrogen atmosphere to form oligostyrene. The HEMA units should be at positions close to and randomly distributed at the chain end of the oligo(methyl methacrylate) block. Thin films of O(S-b-MrH)s were deposited by spin-coating from 1 wt % toluene solutions onto clean silicon substrates and annealed at 160°C for 24 h under vacuum. Atomic force microscopy measurement revealed that the brushes had no detectable microphase separation.

Bibliographic Details

Shengxiang Ji; Wen Liao; Paul F. Nealey

American Chemical Society (ACS)

Chemistry; Materials Science

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