Block cooligomers: A generalized approach to controlling the wetting behavior of block copolymer thin films
Macromolecules, ISSN: 0024-9297, Vol: 43, Issue: 16, Page: 6919-6922
2010
- 29Citations
- 27Captures
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Article Description
A block cooligomer approach to controlling the wetting behaviors of block copolymers in thin films was reported. O(S-b-MrH) was synthesized by two-step sequential nitroxide mediated polymerization using a nitroxide initiator, N-tert-butyl-N-(2-methyl-1-phenylpropyl)-O-(1-phenylethyl)hydroxylamine. Styrene (S), methyl methacrylate (MMA), and hydroxyethyl methacrylate (HEMA) were purified by passing through activated alumina prior to use. Styrene was first polymerized in presence of initiator at δ120°C for 4 h under a nitrogen atmosphere to form oligostyrene. The HEMA units should be at positions close to and randomly distributed at the chain end of the oligo(methyl methacrylate) block. Thin films of O(S-b-MrH)s were deposited by spin-coating from 1 wt % toluene solutions onto clean silicon substrates and annealed at 160°C for 24 h under vacuum. Atomic force microscopy measurement revealed that the brushes had no detectable microphase separation.
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