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Solvent vapor annealing of block polymer thin films

Macromolecules, ISSN: 0024-9297, Vol: 46, Issue: 14, Page: 5399-5415
2013
  • 495
    Citations
  • 0
    Usage
  • 538
    Captures
  • 1
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    495
    • Citation Indexes
      495
  • Captures
    538
  • Mentions
    1
    • References
      1
      • Wikipedia
        1

Review Description

This Perspective provides a critical analysis of the current knowledge concerning solvent vapor annealing (SVA) of block polymer thin films. Herein, we identify key challenges that will be important to overcome for future development of SVA as a practical, reliable, and universal technique for the valorization of block polymer thin films in a wide range of technologies. The Perspective includes a brief background on thin film block polymer self-assembly, a historical account of the SVA technique, an overview of the SVA fundamentals that are necessary to develop a more comprehensive picture of the overall process, and summaries of relevant and important contributions from the recent literature. We also offer our outlook on SVA and suggest important future directions. © 2013 American Chemical Society.

Bibliographic Details

Sinturel, Christophe; Vayer, Marylène; Morris, Michael; Hillmyer, Marc A.

American Chemical Society (ACS)

Chemistry; Materials Science

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