Silica coated PbS nanowires
Journal of Materials Chemistry, ISSN: 0959-9428, Vol: 16, Issue: 12, Page: 1113-1115
2006
- 36Citations
- 18Captures
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Article Description
The deposition of PbS nanowires (NW) glazed with silica by CVD using PbCl and S on silicon substrates at temperatures between 650 and 700°C, was analyzed. The silicon species responsible for the sheathing process will probably have originated from erosion of Si substrates during deposition. It was observed that at 700°, several types of NWs are grown depending on the position of the substrates. The results show that a silica sheath is also present around the NWs which is significantly less than for those grown at 650°C on substrate.
Bibliographic Details
Royal Society of Chemistry (RSC)
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