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Silica coated PbS nanowires

Journal of Materials Chemistry, ISSN: 0959-9428, Vol: 16, Issue: 12, Page: 1113-1115
2006
  • 36
    Citations
  • 0
    Usage
  • 18
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    36
    • Citation Indexes
      36
  • Captures
    18

Article Description

The deposition of PbS nanowires (NW) glazed with silica by CVD using PbCl and S on silicon substrates at temperatures between 650 and 700°C, was analyzed. The silicon species responsible for the sheathing process will probably have originated from erosion of Si substrates during deposition. It was observed that at 700°, several types of NWs are grown depending on the position of the substrates. The results show that a silica sheath is also present around the NWs which is significantly less than for those grown at 650°C on substrate.

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