Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry: Environment stability and activation by simple vacuum oven desiccation
Analyst, ISSN: 1364-5528, Vol: 141, Issue: 16, Page: 4973-4981
2016
- 15Citations
- 8Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Metrics Details
- Citations15
- Citation Indexes15
- 15
- CrossRef14
- Captures8
- Readers8
Article Description
Nanoscale silicon surface-assisted laser desorption/ionization mass spectrometry (SALDI-MS) is an emerging matrix-free, highly sensitive MS analysis method. An important challenge in using nanoscale silicon SALDI-MS analysis is the aging and stability of silicon after storage in various environments. No proper nanoscale silicon SALDI-MS activation procedure has been reported to solve this issue. This study investigated the sensitivity, wettability, and surface oxidation behavior of nanoscale silicon surface SALDI-MS in a room, an inert gas atmosphere, and a vacuum environment. A simple vacuum oven desiccation was proposed to activate the SALDI-MS surface, and the limit of detection was further enhanced 1000 times to a 500 attomole level using this approach. The long-term stability and desorption/ionization mechanism were also investigated.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84980387492&origin=inward; http://dx.doi.org/10.1039/c6an00659k; http://www.ncbi.nlm.nih.gov/pubmed/27315049; https://xlink.rsc.org/?DOI=C6AN00659K; http://xlink.rsc.org/?DOI=C6AN00659K; http://pubs.rsc.org/en/content/articlepdf/2016/AN/C6AN00659K; https://dx.doi.org/10.1039/c6an00659k; https://pubs.rsc.org/en/content/articlelanding/2016/an/c6an00659k
Royal Society of Chemistry (RSC)
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