Highly conformal fabrication of nanopatterns on non-planar surfaces
Nanoscale, ISSN: 2040-3372, Vol: 8, Issue: 22, Page: 11461-11466
2016
- 9Citations
- 15Captures
Metric Options: CountsSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Metrics Details
- Citations9
- Citation Indexes9
- CrossRef6
- Captures15
- Readers15
- 15
Article Description
While the number of techniques for patterning materials at the nanoscale exponentially increases, only a handful of methods approach the conformal patterning of strongly non-planar surfaces. Here, using the direct surface self-assembly of colloids by electrostatics, we produce highly conformal bottom-up nanopatterns with a short-range order. We illustrate the potential of this approach by devising functional nanopatterns on highly non-planar substrates such as pyramid-textured silicon substrates and inherently rough polycrystalline films. We further produce functionalized polycrystalline thin-film silicon solar cells with enhanced optical performance. The perspective presented here to pattern essentially any surface at the nanoscale, in particular surfaces with high inherent roughness or with microscale features, opens new possibilities in a wide range of advanced technologies from affordable photovoltaics and optoelectronics to cellular engineering.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84973525430&origin=inward; http://dx.doi.org/10.1039/c6nr00749j; http://www.ncbi.nlm.nih.gov/pubmed/27193504; http://xlink.rsc.org/?DOI=C6NR00749J; http://pubs.rsc.org/en/content/articlepdf/2016/NR/C6NR00749J; https://xlink.rsc.org/?DOI=C6NR00749J; https://dx.doi.org/10.1039/c6nr00749j; https://pubs.rsc.org/en/content/articlelanding/2016/nr/c6nr00749j
Royal Society of Chemistry (RSC)
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