Eco-friendly photolithography using water-developable pure silk fibroin
RSC Advances, ISSN: 2046-2069, Vol: 6, Issue: 45, Page: 39330-39334
2016
- 52Citations
- 62Captures
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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Article Description
We report that pure silk fibroin can be a green and biofunctional photoresist for deep ultraviolet photolithography. All processes are entirely water-based, from resist solvent to resist removal, and rely on the phototendering effect that decreases the crystallinity of silk fibroin films by DUV exposure. Additionally, the potential decrease in activity of bio-dopants due to high-energy irradiation is irrelevant to our positive-tone lithographic method.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84968719068&origin=inward; http://dx.doi.org/10.1039/c6ra04516b; http://xlink.rsc.org/?DOI=C6RA04516B; http://pubs.rsc.org/en/content/articlepdf/2016/RA/C6RA04516B; https://xlink.rsc.org/?DOI=C6RA04516B; https://dx.doi.org/10.1039/c6ra04516b; https://pubs.rsc.org/en/content/articlelanding/2016/ra/c6ra04516b
Royal Society of Chemistry (RSC)
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