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Epitaxial growth and metallicity of rutile MoO thin film

RSC Advances, ISSN: 2046-2069, Vol: 6, Issue: 65, Page: 60704-60708
2016
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Metrics Details

  • Citations
    34
    • Citation Indexes
      34
  • Captures
    34

Article Description

Molybdenum oxides have various crystal structures and physical properties due to the multiple valence states of the 4d molybdenum. Among them, MoO has a distorted rutile structure with chemical stability and metallic behavior. In this study we grew epitaxial (100) MoO thin films on (0001) AlO substrates. Through careful control of the Ar-partial pressure and growth temperature, we determined the optimal growth condition. From our structural assessments, MoO epitaxial thin films with high crystallinity can only be achieved in very narrow growth conditions such as 500 °C and 7 mTorr. The thin film prepared under optimal condition showed good metallic behavior, which was confirmed by electronic transport and optical reflectance measurements. A detailed electronic structure was also investigated by spectroscopic ellipsometry.

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