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Pulsed laser-deposited n-Si/NiO photoanodes for stable and efficient photoelectrochemical water splitting

Catalysis Science and Technology, ISSN: 2044-4761, Vol: 7, Issue: 12, Page: 2632-2638
2017
  • 25
    Citations
  • 0
    Usage
  • 32
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    25
    • Citation Indexes
      25
  • Captures
    32

Article Description

An electrocatalytic and stable nickel oxide (NiO) thin layer was successfully deposited on an n-Si (100) substrate by pulsed laser deposition (PLD), acting as a photoanode for efficient photo-oxidation of water under solar illumination. It was revealed that the formed n-Si/NiO heterojunction with good Schottky contact could improve photogenerated charge separation, and thus n-Si photoanodes deposited with a 105 nm-thick NiO electrocatalytic layer exhibited a photovoltage of ∼350 mV, leading to greatly improved photoelectrochemical performances for water oxidation. The stability of the photoanode was significantly enhanced with the increasing thickness of NiO protective layers. This study demonstrates a simple and effective method to enable the use of planar n-Si (100) substrates as efficient and durable photoanodes for practical solar water oxidation.

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