Pulsed laser-deposited n-Si/NiO photoanodes for stable and efficient photoelectrochemical water splitting
Catalysis Science and Technology, ISSN: 2044-4761, Vol: 7, Issue: 12, Page: 2632-2638
2017
- 25Citations
- 32Captures
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Article Description
An electrocatalytic and stable nickel oxide (NiO) thin layer was successfully deposited on an n-Si (100) substrate by pulsed laser deposition (PLD), acting as a photoanode for efficient photo-oxidation of water under solar illumination. It was revealed that the formed n-Si/NiO heterojunction with good Schottky contact could improve photogenerated charge separation, and thus n-Si photoanodes deposited with a 105 nm-thick NiO electrocatalytic layer exhibited a photovoltage of ∼350 mV, leading to greatly improved photoelectrochemical performances for water oxidation. The stability of the photoanode was significantly enhanced with the increasing thickness of NiO protective layers. This study demonstrates a simple and effective method to enable the use of planar n-Si (100) substrates as efficient and durable photoanodes for practical solar water oxidation.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=85022199885&origin=inward; http://dx.doi.org/10.1039/c7cy00114b; http://xlink.rsc.org/?DOI=C7CY00114B; http://pubs.rsc.org/en/content/articlepdf/2017/CY/C7CY00114B; https://xlink.rsc.org/?DOI=C7CY00114B; https://dx.doi.org/10.1039/c7cy00114b; https://pubs.rsc.org/en/content/articlelanding/2017/cy/c7cy00114b
Royal Society of Chemistry (RSC)
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