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CVD controlled growth of large-scale WS monolayers

RSC Advances, ISSN: 2046-2069, Vol: 9, Issue: 51, Page: 29628-29635
2019
  • 22
    Citations
  • 0
    Usage
  • 72
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    22
    • Citation Indexes
      22
  • Captures
    72

Article Description

Monolayer tungsten disulfide (WS) with a direct band gap of ca. 2.0 eV and stable properties has been a hotspot in two-dimensional (2D) nanoelectronics and optoelectronics. However, it remains challenging to successfully prepare monolayer WS. In this paper, we report the chemical vapor deposition (CVD) growth behavior of hexagonal WS monolayers by using WS powders and sodium triosulfate (NaSO) as precursors. We observed the NaSO has a significant effect on the WS triangular and leaf-like shapes. In addition, based on proposed S-termination and W-termination theory, the growth mechanisms for different shapes of WS were discussed.

Bibliographic Details

Xu, Zhuhua; Lv, Yanfei; Li, Jingzhou; Huang, Feng; Nie, Pengbo; Zhang, Siwei; Zhao, Shichao; Zhao, Shixi; Wei, Guodan

Royal Society of Chemistry (RSC)

Chemistry; Chemical Engineering

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