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Correlations between deposition parameters and structural and electrical properties of YBaCuO thin films grown in situ by sequential ion beam sputtering

Applied Physics Letters, ISSN: 0003-6951, Vol: 56, Issue: 24, Page: 2468-2470
1990
  • 22
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Metrics Details

  • Citations
    22
    • Citation Indexes
      22
  • Captures
    3

Article Description

We have studied the correlations between deposition parameters and structural and electrical properties of YBaCuO thin films grown in situ by sequential ion beam sputtering. Epitaxial, c-axis oriented YBaCuO films were grown both on (100) SrTiO and on (100) MgO substrates following the stacking sequence of the "123" compound, with deposited layer thicknesses nominally equal to 1 monolayer. The c-axis lattice parameters obtained were larger than the corresponding lattice parameter in bulk samples, even after low-temperature anneals in O. The transition temperatures were found to decrease with the enlargement of the c-axis lattice parameter. A clear correlation between growth temperature and the value of the c-axis lattice parameter was observed. The c-axis lattice parameter and the x-ray linewidth of Bragg reflections with the G vector along the c-axis were also found to be correlated. This suggests a relationship between the c-axis lattice parameter and the structural coherence of the epitaxial films.

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