Correlations between deposition parameters and structural and electrical properties of YBaCuO thin films grown in situ by sequential ion beam sputtering
Applied Physics Letters, ISSN: 0003-6951, Vol: 56, Issue: 24, Page: 2468-2470
1990
- 22Citations
- 3Captures
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Article Description
We have studied the correlations between deposition parameters and structural and electrical properties of YBaCuO thin films grown in situ by sequential ion beam sputtering. Epitaxial, c-axis oriented YBaCuO films were grown both on (100) SrTiO and on (100) MgO substrates following the stacking sequence of the "123" compound, with deposited layer thicknesses nominally equal to 1 monolayer. The c-axis lattice parameters obtained were larger than the corresponding lattice parameter in bulk samples, even after low-temperature anneals in O. The transition temperatures were found to decrease with the enlargement of the c-axis lattice parameter. A clear correlation between growth temperature and the value of the c-axis lattice parameter was observed. The c-axis lattice parameter and the x-ray linewidth of Bragg reflections with the G vector along the c-axis were also found to be correlated. This suggests a relationship between the c-axis lattice parameter and the structural coherence of the epitaxial films.
Bibliographic Details
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0038506206&origin=inward; http://dx.doi.org/10.1063/1.103258; https://pubs.aip.org/apl/article/56/24/2468/57147/Correlations-between-deposition-parameters-and; http://scitation.aip.org/content/aip/journal/apl/56/24/10.1063/1.103258; http://scitation.aip.org/limit_exceeded.html
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