Isotopic study of metalorganic chemical vapor deposition of (Ba, Sr)TiO films on Pt

Isotopic labeling experiments (O) have been carried out to understand the film-formation reactions in the metalorganic chemical vapor deposition of (Ba, Sr)TiO (BST) films. Time-of-flight secondary ion mass spectrometry reveals both M O and M O (M=Ba, Sr, Ti) in the BST films, indicating that the oxygen in the BST films originates from both the gas phase oxidants (O), and the precursor ligands (O). Use of a 50% O-50% NO mixture results in a reduction of O incorporation in the BST film, indicating direct involvement of NO in the film-formation reactions. Addition of NO in O also appears to improve film surface morphology and step coverage. © 1999 American Institute of Physics.