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Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold

Applied Physics Letters, ISSN: 0003-6951, Vol: 81, Issue: 8, Page: 1483-1485
2002
  • 148
    Citations
  • 0
    Usage
  • 40
    Captures
  • 0
    Mentions
  • 0
    Social Media
Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    148
    • Citation Indexes
      148
  • Captures
    40

Article Description

A nanomolding process for producing 55-nm-diameter magnetic islands over 3-cm-wide areas is described. A master pattern of SiO pillars is used to form a polymeric mold, which is in turn used to mold a photopolymer resist film. This latter film is used as a resist for etching SiO, yielding a pattern of pillars. Finally, an 11-nm-CoPt multilayer is deposited. Magnetic force microscopy reveals that the film on top of each pillar is a magnetically isolated single domain that switches independently. © 2002 American Institute of Physics.

Bibliographic Details

Gary M. McClelland; Mark W. Hart; Charles T. Rettner; Margaret E. Best; Kenneth R. Carter; Bruce D. Terris

AIP Publishing

Physics and Astronomy

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