Statistical model for prebreakdown current jumps and breakdown caused by single traps in magnetic tunnel junctions
Journal of Applied Physics, ISSN: 0021-8979, Vol: 94, Issue: 4, Page: 2749-2751
2003
- 15Citations
- 5Captures
Metric Options: Counts1 Year3 YearSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
The degradation and breakdown of magnetic tunnel junctions (MTJ) with a 1. 6 nm AlO tunnel barrier formed by ultraviolet (UV) light assisted oxidation was analyzed. The reliability concepts used for SiO were applied to AlO. The observed degradation was shown to be due to the generation of single traps.
Bibliographic Details
Provide Feedback
Have ideas for a new metric? Would you like to see something else here?Let us know