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Enhanced low-temperature magnetoresistance in facing-target reactive sputtered Ni-C Nx composite films

Applied Physics Letters, ISSN: 0003-6951, Vol: 89, Issue: 24
2006
  • 11
    Citations
  • 0
    Usage
  • 4
    Captures
  • 0
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Metric Options:   Counts1 Year3 Year

Metrics Details

  • Citations
    11
    • Citation Indexes
      11
  • Captures
    4

Article Description

Ni-C Nx films with ∼23 at. % Ni, fabricated using facing-target reactive sputtering, are composed of metallic Ni, Ni-N, Ni-C, and CN compounds, showing the morphology of ∼1-5 nm Ni-rich particles embedded in amorphous CN matrix. The films exhibit superparamagnetism with an average blocking temperature of ∼100 K. Below 20 K the tunneling magnetoresistance MR= [R (H) -R (0)] R (0) increases rapidly, following log ∫MR∫ -T relation with decreasing temperature. By optimizing the nitrogen partial pressure, the 3 K MR maximum can reach -59% at 90 kOe field, which can be mainly ascribed to the high-order tunneling process. © 2006 American Institute of Physics.

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