Influence of deposition conditions on the properties of sputter-deposited Co-V thin films
Journal of Applied Physics, ISSN: 0021-8979, Vol: 61, Issue: 8, Page: 3155-3157
1987
- 3Citations
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Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
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- Citations3
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Article Description
In the present study, Co-V films (17 at. % V) were deposited by rf sputtering onto several substrates that are candidates for magnetic recording substrates: glass; SiO/Si; Ni-P/Al; and Corning Fotoceram. Films were deposited through a range of deposition variables, and their magnetic properties were measured in the film plane and perpendicular to the film plane. Magnetic orientation ratios on the various substrates range from <0.10 to >0.50. The substrate bias was one of the most important deposition parameters, and the response of coercivity to the bias voltage was much greater on glass than on any other substrate. On glass the perpendicular coercivity increased from 238 to 1360 Oe as the bias increased from 0 to 100 V. X-ray diffraction showed the films to be either amorphous or crystalline with preferred orientation. In general, amorphous films were deposited with zero substrate bias, while crystalline films were more easily obtained under conditions of substrate bias. The degree of crystallinity is a major determining factor for the magnetic properties of these films.
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