Modeling of pulsed laser etching of high-T superconductors
Journal of Applied Physics, ISSN: 0021-8979, Vol: 68, Issue: 10, Page: 5273-5277
1990
- 12Citations
- 3Captures
Metric Options: Counts1 Year3 YearSelecting the 1-year or 3-year option will change the metrics count to percentiles, illustrating how an article or review compares to other articles or reviews within the selected time period in the same journal. Selecting the 1-year option compares the metrics against other articles/reviews that were also published in the same calendar year. Selecting the 3-year option compares the metrics against other articles/reviews that were also published in the same calendar year plus the two years prior.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Example: if you select the 1-year option for an article published in 2019 and a metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019. If you select the 3-year option for the same article published in 2019 and the metric category shows 90%, that means that the article or review is performing better than 90% of the other articles/reviews published in that journal in 2019, 2018 and 2017.
Citation Benchmarking is provided by Scopus and SciVal and is different from the metrics context provided by PlumX Metrics.
Article Description
Modeling of pulsed laser ablation has been applied to investigate the etching of high-T superconducting films of YBaCu O and BiSrCaCu O. Calculations based on solutions to the one-dimensional heat equation and using parameters characteristic of the experiments indicate that diffusion does not play a major role and the dominant process is an evaporation mechanism taking place at the surface. Hence the ablation is modeled by solving the dynamical equations for a very thin heated layer in local equilibrium with the ablated material. With reasonable assumptions for the heat of evaporation (sublimation) and the phase equilibrium curve, the etch depth per pulse can be determined along with a number of other parameters. The results are in accord with observation.
Bibliographic Details
Provide Feedback
Have ideas for a new metric? Would you like to see something else here?Let us know