Characterization of Si-SiO interface states: Comparison between different charge pumping and capacitance techniques

The three-level and spectroscopic charge pumping techniques, deep level transient spectroscopy and capacitance-voltage measurements are both used to determine the energy distribution of Si-SiO interface states on submicrometer metal-oxide-semiconductor field-effect transistors and metal-oxide-semiconductor capacitors. This study is a systematic comparative analysis between charge pumping techniques and capacitance measurements. The measurements have been performed on different structures (n- and p-type materials, low and high interface states densities) and the performances of each technique have been compared.